POLISHING FLUID AND POLISHING METHOD

Details for Australian Patent Application No. 2003248101 (hide)

Owner HITACHI CHEMICAL CO., LTD.

Inventors FUKASAWA, Masato

Pub. Number AU-A-2003248101

PCT Number PCT/JP03/09389

PCT Pub. Number WO2004/012248

Priority 2002-216428 25.07.02 JP; 2002-216423 25.07.02 JP

Filing date 24 July 2003

Wipo publication date 16 February 2004

International Classifications

H01L 021/304 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

C09K 003/14 Materials not provided for elsewhere - Anti-slip materials

Event Publications

2 October 2003 Complete Application Filed

  Priority application(s): 2002-216428 25.07.02 JP; 2002-216423 25.07.02 JP

25 March 2004 Application Open to Public Inspection

  Published as AU-A-2003248101

14 April 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

Legal

The information provided by the Site not in the nature of legal or other professional advice. The information provided by the Site is derived from third parties and may contain errors. You must make your own enquiries and seek independent advice from the relevant industry professionals before acting or relying on any information contained herein. Check the above data against the Australian Patent Office AUSPAT database.

Next and Previous Patents/Applications

2003248102-VACUUM CLEANER

2003248100-METHOD FOR PRODUCING CARBONYL COMPOUND