EXPOSURE TRANSFER MASK AND EXPOSURE TRANSFER MASK PATTERN EXCHANGE METHOD

Details for Australian Patent Application No. 2003244215 (hide)

Owner OCTEC INC.

Inventors OKUMURA, Katsuya; NAGASEKI, Kazuya; SATOH, Naoyuki

Pub. Number AU-A-2003244215

PCT Number PCT/JP03/08608

PCT Pub. Number WO2004/008508

Priority 2002-202097 11.07.02 JP

Filing date 7 July 2003

Wipo publication date 2 February 2004

International Classifications

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

G03F 001/16 Preparation of originals for the photomechanical production of textured or patterned surfaces - Originals having apertures, e.g. for corpuscular lithography

G03F 007/20 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Exposure

Event Publications

18 September 2003 Complete Application Filed

  Priority application(s): 2002-202097 11.07.02 JP

18 March 2004 Application Open to Public Inspection

  Published as AU-A-2003244215

7 April 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

18 August 2005 Corrigenda

  Applications OPI - Name Index Under the name OCTEC INC., Application No. 2003244215, under INID (71) correct the name to read OCTEC INC.; TOKYO ELECTRON LIMITED Corrigenda

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