ACTIVE ENERGY RAY SENSITIVE RESIN COMPOSITION, ACTIVE ENERGY RAY SENSITIVE RESIN FILM AND METHOD FOR FORMING PATTERN USING SAID FILM

Details for Australian Patent Application No. 2003244211 (hide)

Owner MURAKAMI CO., LTD. ICHIMURA, Kunihiro

Inventors KAWANOBE, Junichi; INOUE, Kazuo; ICHIMURA, Kunihiro; ADACHI, Daisaku; MORITA, Tomoyuki

Pub. Number AU-A-2003244211

PCT Number PCT/JP03/08539

PCT Pub. Number WO2004/013700

Priority 2002-196577 04.07.02 JP

Filing date 4 July 2003

Wipo publication date 23 February 2004

International Classifications

G03F 007/038 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Macromolecular compounds which are rendered insoluble or differentially wettable

Event Publications

18 September 2003 Complete Application Filed

  Priority application(s): 2002-196577 04.07.02 JP

1 April 2004 Application Open to Public Inspection

  Published as AU-A-2003244211

7 April 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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