PLASMA PROCESSING METHOD

Details for Australian Patent Application No. 2003244166 (hide)

Owner TOKYO ELECTRON LIMITED

Inventors NAGASEKI, Kazuya; KOH, Akiteru; ENOMOTO, Takashi; ITO, Hiroharu; KITAMURA, Akinori; YAMAGUCHI, Tomoyo; FUSE, Takashi; FUJIMOTO, Kiwamu; HONDA, Masanobu

Pub. Number AU-A-2003244166

PCT Number PCT/JP03/07960

PCT Pub. Number WO2004/003988

Priority 60/423,566 05.11.02 US; 2003-003540 09.01.03 JP; 2003-110225 15.04.03 JP; 2003-151416 28.05.03 JP; 2002-187422 27.06.02 JP; 2002-214628 24.07.02 JP; 2002-271588 18.09.02 JP; 2002-271589 18.09.02 JP; 60/420,788 24.10.02 US

Filing date 24 June 2003

Wipo publication date 19 January 2004

International Classifications

H01L 021/3065 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

18 September 2003 Complete Application Filed

  Priority application(s): 60/423,566 05.11.02 US; 2003-003540 09.01.03 JP; 2003-110225 15.04.03 JP; 2003-151416 28.05.03 JP; 2002-187422 27.06.02 JP; 2002-214628 24.07.02 JP; 2002-271588 18.09.02 JP; 2002-271589 18.09.02 JP; 60/420,788 24.10.02 US

4 March 2004 Application Open to Public Inspection

  Published as AU-A-2003244166

17 March 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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