METHOD OF CLEANING SUBSTRATE TREATMENT APPARATUS

Details for Australian Patent Application No. 2003244019 (hide)

Owner TOKYO ELECTRON LIMITED

Inventors DOBASHI, Kazuya; OSHIMA, Yasuhiro

Pub. Number AU-A-2003244019

PCT Number PCT/JP03/08318

PCT Pub. Number WO2004/006317

Priority 2002-197364 05.07.02 JP

Filing date 1 July 2003

Wipo publication date 23 January 2004

International Classifications

H01L 021/31 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

C23C 016/44 Chemical deposition or plating by decomposition - characterised by the method of coating

H01L 021/3065 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

18 September 2003 Complete Application Filed

  Priority application(s): 2002-197364 05.07.02 JP

11 March 2004 Application Open to Public Inspection

  Published as AU-A-2003244019

7 April 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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