ELECTRON BEAM EXPOSURE METHOD AND SYSTEM THEREFOR

Details for Australian Patent Application No. 2003244004 (hide)

Owner KABUSHIKI KAISHA PD SERVICE

Inventors HISATSUGU, Tokushige

Pub. Number AU-A-2003244004

PCT Number PCT/JP03/08145

PCT Pub. Number WO2004/006307

Priority 2002-227945 03.07.02 JP

Filing date 26 June 2003

Wipo publication date 23 January 2004

International Classifications

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

G03F 007/20 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Exposure

Event Publications

18 September 2003 Complete Application Filed

  Priority application(s): 2002-227945 03.07.02 JP

11 March 2004 Application Open to Public Inspection

  Published as AU-A-2003244004

17 March 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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