Owner E.T.C. EPITAXIAL TECHNOLOGY CENTER S.R.L.

Inventors SPECIALE, Natale; VALENTE, Gianluca; CRIPPA, Danilo; PRETI, Franco

Pub. Number AU-A-2003242999

PCT Number PCT/IT03/00363

PCT Pub. Number WO2004/053189

Priority PCT/IT02/00774 10.12.02 IT

Filing date 11 June 2003

Wipo publication date 30 June 2004

C23C 016/46 Chemical deposition or plating by decomposition - characterised by the method used for heating the substrate

C30B 025/12 Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour deposition growth - Substrate holders or susceptors

C30B 025/10 Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour deposition growth - Heating of the reaction chamber or the substrate

C30B 031/12 After-treatment of single crystals or homogeneous polycrystalline material with defined structure

H05B 006/02 Heating by electric, magnetic, or electromagnetic fields - Induction heating

F27B 014/06 Crucible or pot furnaces

H01L 021/00 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

C23C 016/458 Chemical deposition or plating by decomposition - characterised by the method used for supporting substrates in the reaction chamber