SPUTTERING TARGET MATERIAL

Details for Australian Patent Application No. 2003242423 (hide)

Owner ISHIFUKU METAL INDUSTRY CO., LTD.

Inventors ASAKI, Tomoyoshi; HASEGAWA, Koichi; ISHII, Nobuo

Pub. Number AU-A-2003242423

PCT Number PCT/JP03/06455

PCT Pub. Number WO2003/100112

Priority 2002-153729 28.05.02 JP

Filing date 23 May 2003

Wipo publication date 12 December 2003

International Classifications

C23C 014/34 Coating by vacuum evaporation, by sputtering or by ion implantation - Sputtering

C23C 014/14 Coating by vacuum evaporation, by sputtering or by ion implantation - Metallic material, boron or silicon

C23C 014/06 Coating by vacuum evaporation, by sputtering or by ion implantation - characterised by the coating material

Event Publications

11 September 2003 Complete Application Filed

  Priority application(s): 2002-153729 28.05.02 JP

5 February 2004 Application Open to Public Inspection

  Published as AU-A-2003242423

3 March 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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