LIQUID DETERGENT FOR SEMICONDUCTOR DEVICE SUBSTRATE AND METHOD OF CLEANING

Details for Australian Patent Application No. 2003238580 (hide)

Owner MITSUBISHI CHEMICAL CORPORATION

Inventors IKEMOTO, Makoto; KAWASE, Yasuhiro; MORINAGA, Hitoshi

Pub. Number AU-A-2003238580

PCT Number PCT/JP03/00714

PCT Pub. Number WO2003/065433

Priority 2002-18547 28.01.02 JP

Filing date 27 January 2003

Wipo publication date 2 September 2003

International Classifications

H01L 021/304 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

B08B 003/08 Cleaning by methods involving the use or presence of liquid or steam - the liquid having chemical or dissolving effect

C11D 001/72 Surface-active non-soap detergents - Ethers of polyoxyalkylene glycols

Event Publications

11 September 2003 Complete Application Filed

  Priority application(s): 2002-18547 28.01.02 JP

18 September 2003 Application Open to Public Inspection

  Published as AU-A-2003238580

27 January 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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