MIXTURE OF SUBSTANCES WHICH CAN BE HARDENED BY HEAT AND BY ACTINIC RADIATION, METHOD FOR THE PRODUCTION AND USE THEREOF

Details for Australian Patent Application No. 2003238361 (hide)

Owner BASF COATINGS AG

Inventors ZUMBRINK, Andrea; BAUMGART, Hubert; HEID, Ingrid; ROCKRATH, Ulrike

Pub. Number AU-A-2003238361

PCT Number PCT/EP03/00822

PCT Pub. Number WO2003/065121

Priority 102 04 114.8 01.02.02 DE

Filing date 28 January 2003

Wipo publication date 2 September 2003

International Classifications

G03F 007/022 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Quinonediazides

C08F 257/02 Macromolecular compounds obtained by polymerising monomers on to polymers of aromatic monomers as defined in group

C08F 283/10 Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass

G03F 007/004 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Photosensitive materials

G03F 007/032 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - with binders

H05K 003/28 Apparatus or processes for manufacturing printed circuits - Applying non-metallic protective coatings

G03F 007/027 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

G03F 007/033 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

C08F 290/04 Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups

G03F 007/016 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Diazonium salts or compounds

G03F 007/023 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Macromolecular quinonediazides

G03C 001/93 Photosensitive materials

G03F 007/11 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - having cover layers or intermediate layers, e.g. subbing layers

Event Publications

11 September 2003 Complete Application Filed

  Priority application(s): 102 04 114.8 01.02.02 DE

18 September 2003 Application Open to Public Inspection

  Published as AU-A-2003238361

27 January 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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