METHOD AND DEVICE FOR ALTERNATING DEPOSITION OF TWO MATERIALS BY CATHODIC SPUTTERING

Details for Australian Patent Application No. 2003238050 (hide)

Owner FRAUNHOFER-GESELLSCHAFT ZUR FORDERUNG DER ANGEWANDTEN FORSCHUNG E. V.

Inventors WINKLER, Torsten; GOEDICKE, Klaus; BLUETHNER, Ralf; LIEBIG, JornSteffen

Pub. Number AU-A-2003238050

PCT Number PCT/EP03/06710

PCT Pub. Number WO2004/015748

Priority 102 34 861.8 31.07.02 DE

Filing date 25 June 2003

Wipo publication date 25 February 2004

International Classifications

H01L 021/00 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

C23C 014/35 Coating by vacuum evaporation, by sputtering or by ion implantation - by application of a magnetic field, e.g. magnetron sputtering

C23C 014/34 Coating by vacuum evaporation, by sputtering or by ion implantation - Sputtering

Event Publications

11 September 2003 Complete Application Filed

  Priority application(s): 102 34 861.8 31.07.02 DE

8 April 2004 Application Open to Public Inspection

  Published as AU-A-2003238050

14 April 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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