METHOD FOR SELECTIVELY REMOVING POLYIMIDE ALIGNMENT LAYER COATED ON NEGATIVE PHOTORESIST FORMED ON A SUBSTRATE AND RECYCLING THE SAME USING PLASMA

Details for Australian Patent Application No. 2003237047 (hide)

International Classifications

Event Publications

11 September 2003 Complete Application Filed

Priority application(s): 10-2003-0010183 18.02.03 KR

14 October 2004 Application Open to Public Inspection

Published as AU-A-2003237047

3 November 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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