PHOTOPOLYMERIZABLE COMPOSITION

Details for Australian Patent Application No. 2003236353 (hide)

Owner KYOWA YUKA CO., LTD.

Inventors YAMAOKA, Tsuguo; SHIMIZU, Ikuo; TOYODA, Hiroshi; KINUGASA, Motoharu; IKUTA, Masanori; KATAGI, Kyoko

Pub. Number AU-A-2003236353

PCT Number PCT/JP03/04254

PCT Pub. Number WO2003/085005

Priority 2002-104616 08.04.02 JP

Filing date 3 April 2003

Wipo publication date 20 October 2003

International Classifications

C08F 002/50 Processes

C07D 413/08 Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms

C07D 417/08 Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group

C07D 231/20 Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings

C07F 003/00 Compounds containing elements of the 2nd Group of the Periodic System

C07F 003/06 Compounds containing elements of the 2nd Group of the Periodic System

C07F 005/06 Compounds containing elements of the 3rd Group of the Periodic System

C09B 023/04 Quinoline or polymethine dyes

C09B 057/00 Other synthetic dyes of known constitution

G03F 007/029 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Inorganic compounds

C07D 231/22 Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings

C07D 403/08 Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group

Event Publications

4 September 2003 Complete Application Filed

  Priority application(s): 2002-104616 08.04.02 JP

27 November 2003 Application Open to Public Inspection

  Published as AU-A-2003236353

27 January 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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