PLASMA PROCESSING DEVICE AND BAFFLE PLATE THEREOF

Details for Australian Patent Application No. 2003236188 (hide)

Owner TOKYO ELECTRON LIMITED

Inventors ITO, Atsushi; ONO, Yoko; ISHIHARA, Hiroyuki; ARAKI, Youichi; TAKAHASHI, Toshiki; KUBO, Takuya

Pub. Number AU-A-2003236188

PCT Number PCT/JP03/03954

PCT Pub. Number WO2003/083923

Priority 2002/96236 29.03.02 JP; 2002/227259 05.08.02 JP

Filing date 28 March 2003

Wipo publication date 13 October 2003

International Classifications

H01L 021/3065 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

4 September 2003 Complete Application Filed

  Priority application(s): 2002/96236 29.03.02 JP; 2002/227259 05.08.02 JP

20 November 2003 Application Open to Public Inspection

  Published as AU-A-2003236188

20 January 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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