CIRCUIT PATTERN DIVIDING METHOD, STENCIL MASK MANUFACTURING METHOD, STENCIL MASK, AND EXPOSURE METHOD

Details for Australian Patent Application No. 2003236154 (hide)

Owner TOPPAN PRINTING CO., LTD.

Inventors EGUCHI, Hideyuki; YOSHII, Takashi; SUGIMURA, Hiroshi; TAMURA, Akira

Pub. Number AU-A-2003236154

PCT Number PCT/JP03/03731

PCT Pub. Number WO2003/081649

Priority 2002-85748 26.03.02 JP

Filing date 26 March 2003

Wipo publication date 8 October 2003

International Classifications

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

G03F 001/16 Preparation of originals for the photomechanical production of textured or patterned surfaces - Originals having apertures, e.g. for corpuscular lithography

G03F 007/20 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Exposure

Event Publications

4 September 2003 Complete Application Filed

  Priority application(s): 2002-85748 26.03.02 JP

13 November 2003 Application Open to Public Inspection

  Published as AU-A-2003236154

20 January 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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