EXPOSURE METHOD, EXPOSURE DEVICE, AND DEVICE MANUFACTURING METHOD

Details for Australian Patent Application No. 2003236023 (hide)

Owner NIKON CORPORATION

Inventors NAGASAKA, Hiroyuki; AOKI, Takashi

Pub. Number AU-A-2003236023

PCT Number PCT/JP03/04515

PCT Pub. Number WO2003/085708

Priority 2002-106783 09.04.02 JP

Filing date 9 April 2003

Wipo publication date 20 October 2003

International Classifications

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

G03F 007/20 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Exposure

Event Publications

4 September 2003 Complete Application Filed

  Priority application(s): 2002-106783 09.04.02 JP

27 November 2003 Application Open to Public Inspection

  Published as AU-A-2003236023

20 January 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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