ECR PLASMA SOURCE AND ECR PLASMA DEVICE

Details for Australian Patent Application No. 2003236008 (hide)

Owner NTT AFTY CORPORATION

Inventors TANAKA, Fumio; MATSUO, Seitaro; NOZAKI, Toshiyuki

Pub. Number AU-A-2003236008

PCT Number PCT/JP03/04481

PCT Pub. Number WO2003/086032

Priority 2002-106710 09.04.02 JP

Filing date 9 April 2003

Wipo publication date 20 October 2003

International Classifications

H05H 001/46 Generating plasma - using applied electromagnetic fields, e.g. high frequency or microwave energy

H01L 021/205 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

C23C 014/22 Coating by vacuum evaporation, by sputtering or by ion implantation - characterised by the process of coating

C23C 016/511 Chemical deposition or plating by decomposition

H01L 021/3065 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

4 September 2003 Complete Application Filed

  Priority application(s): 2002-106710 09.04.02 JP

27 November 2003 Application Open to Public Inspection

  Published as AU-A-2003236008

20 January 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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