AUTOMATIC VALVE CONTROL SYSTEM IN PLASMA CHEMICAL VAPOR DEPOSITION SYSTEM AND CHEMICAL VAPOR DEPOSITION SYSTEM FOR DEPOSITION OF NANO-SCALE MULTILAYER FILM

Details for Australian Patent Application No. 2003235486 (hide)

International Classifications

Event Publications

4 September 2003 Complete Application Filed

Priority application(s): 10-2002-0018785 06.04.02 KR

4 December 2003 Application Open to Public Inspection

Published as AU-A-2003235486

20 January 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

Legal

The information provided by the Site not in the nature of legal or other professional advice. The information provided by the Site is derived from third parties and may contain errors. You must make your own enquiries and seek independent advice from the relevant industry professionals before acting or relying on any information contained herein. Check the above data against the Australian Patent Office AUSPAT database.