LIGHT-ABSORBING POLYMER FOR FORMING ORGANIC ANTIREFLECTIVE LAYER, COMPOSITION INCLUDING THE SAME, AND METHOD FOR FORMING SEMICONDUCTOR DEVICE PATTERN USING THE SAME

Details for Australian Patent Application No. 2003235226 (hide)

Owner MOLAY CO., LTD.

Inventors LEE, KwanKu

Pub. Number AU-A-2003235226

PCT Number PCT/KR03/00964

PCT Pub. Number WO2003/098670

Priority 10-2002-0027254 17.05.02 KR

Filing date 16 May 2003

Wipo publication date 2 December 2003

International Classifications

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

G03F 007/039 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Macromolecular compounds which are photodegradable, e.g. positive electron resists

C07C 309/73 Sulfonic acids

Event Publications

4 September 2003 Complete Application Filed

  Priority application(s): 10-2002-0027254 17.05.02 KR

29 January 2004 Application Open to Public Inspection

  Published as AU-A-2003235226

3 February 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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