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Details for Australian Patent Application No. 2003235162 (hide)

Owner TOKYO ELECTRON LIMITED

Inventors KANNAN, Hiroshi

Pub. Number AU-A-2003235162

PCT Number PCT/JP03/04774

PCT Pub. Number WO2003/087430

Priority 2002-113414 16.04.02 JP

Filing date 15 April 2003

Wipo publication date 27 October 2003

International Classifications

C23C 016/46 Chemical deposition or plating by decomposition - characterised by the method used for heating the substrate

H01L 021/205 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

4 September 2003 Complete Application Filed

  Priority application(s): 2002-113414 16.04.02 JP

4 December 2003 Application Open to Public Inspection

  Published as AU-A-2003235162

20 January 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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