EXPOSURE SYSTEM AND DEVICE MANUFACTURING METHOD

Details for Australian Patent Application No. 2003235124 (hide)

Owner NIKON CORPORATION

Inventors NAGAHASHI, Yoshitomo; FUJII, Manabu; MURAKAMI, Hironori; TSUJI, Toshihiko

Pub. Number AU-A-2003235124

PCT Number PCT/JP03/05283

PCT Pub. Number WO2003/092057

Priority 2002-122567 24.04.02 JP

Filing date 24 April 2003

Wipo publication date 10 November 2003

International Classifications

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

G03F 007/20 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Exposure

Event Publications

4 September 2003 Complete Application Filed

  Priority application(s): 2002-122567 24.04.02 JP

18 December 2003 Application Open to Public Inspection

  Published as AU-A-2003235124

20 January 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

18 August 2005 Corrigenda

  Applications OPI - Name Index Under the name NIKON CORPORATION, Application No. 2003235124, under INID (71) correct the name to read SENDAI NIKON CORPORATION; NIKON CORPORATION

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