SUBSTRATE PROCESSING DEVICE, SUBSTRATE PROCESSING METHOD, AND DEVELOPING DEVICE

Details for Australian Patent Application No. 2003234811 (hide)

Owner TOKYO ELECTRON LIMITED

Inventors AWAMURA, Tetsutoshi; KIBA, Yukio; TANAKA, Keiichi; OKUBO, Takahiro; NISHIKIDO, Shuuichi

Pub. Number AU-A-2003234811

PCT Number PCT/JP03/06149

PCT Pub. Number WO2003/105201

Priority 2002-167565 07.06.02 JP; 2002-166941 07.06.02 JP

Filing date 16 May 2003

Wipo publication date 22 December 2003

International Classifications

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

G03F 007/30 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Imagewise removal using liquid means

Event Publications

28 August 2003 Complete Application Filed

  Priority application(s): 2002-167565 07.06.02 JP; 2002-166941 07.06.02 JP

19 February 2004 Application Open to Public Inspection

  Published as AU-A-2003234811

24 February 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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