PLASMA-ASSISTED COATING

Details for Australian Patent Application No. 2003234477 (hide)

Owner DANA CORPORATION

Inventors KUMAR, Devendra; KUMAR, Satyendra

Pub. Number AU-A-2003234477

PCT Number PCT/US03/14037

PCT Pub. Number WO2003/096770

Priority 60/378,693 08.05.02 US; 60/430,677 04.12.02 US; 60/435,278 23.12.02 US

Filing date 7 May 2003

Wipo publication date 11 November 2003

International Classifications

H05H 001/46 Generating plasma - using applied electromagnetic fields, e.g. high frequency or microwave energy

C23C 016/517 Chemical deposition or plating by decomposition

C23C 016/455 Chemical deposition or plating by decomposition - characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber

C23C 016/452 Chemical deposition or plating by decomposition

C23C 014/02 Coating by vacuum evaporation, by sputtering or by ion implantation - Pretreatment of the material to be coated

C23C 016/48 Chemical deposition or plating by decomposition - by irradiation, e.g. photolysis, radiolysis, particle radiation

H05H 001/00 Generating plasma

Event Publications

28 August 2003 Complete Application Filed

  Priority application(s): 60/378,693 08.05.02 US; 60/430,677 04.12.02 US; 60/435,278 23.12.02 US

15 January 2004 Application Open to Public Inspection

  Published as AU-A-2003234477

27 January 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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