METHOD AND DEVICE FOR PLASMA TREATING WORKPIECES

Details for Australian Patent Application No. 2003233772 (hide)

Owner SIG TECHNOLOGY LTD.

Inventors LITZENBERG, Michael; LEWIN, Frank; MULLER, Hartwig; VOGEL, Klaus; ARNOLD, Gregor; BEHLE, Stephan; LUTTRINGHAUS-HENKEL, Andreas; BICKER, Matthias; KLEIN, Jurgen

Pub. Number AU-A-2003233772

PCT Number PCT/DE03/01504

PCT Pub. Number WO2003/100124

Priority 102 23 288.1 24.05.02 DE; 102 25 607.1 07.06.02 DE

Filing date 9 May 2003

Wipo publication date 12 December 2003

International Classifications

C23C 016/455 Chemical deposition or plating by decomposition - characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber

C30B 025/14 Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour deposition growth - Feed and outlet means for the gases

C23C 014/56 Coating by vacuum evaporation, by sputtering or by ion implantation - Apparatus specially adapted for continuous coating

C23C 016/04 Chemical deposition or plating by decomposition - Coating on selected surface areas, e.g. using masks

Event Publications

28 August 2003 Complete Application Filed

  Priority application(s): 102 23 288.1 24.05.02 DE; 102 25 607.1 07.06.02 DE

5 February 2004 Application Open to Public Inspection

  Published as AU-A-2003233772

10 February 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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