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Details for Australian Patent Application No. 2003232437 (hide)

Owner INPHASE TECHNOLOGIES, INC.

Inventors IHAS, Benjamin, C.; SETTHACHAYANON, Songvit; PHAN, Xuan, T.; MICHAELS, Mark, David

Pub. Number AU-A-2003232437

PCT Number PCT/US03/17010

PCT Pub. Number WO2003/102693

Priority 60/383,607 29.05.02 US

Filing date 29 May 2003

Wipo publication date 19 December 2003

International Classifications

G03F 007/027 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

G03F 007/00 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces

C07C 323/16 Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups

C08F 020/00 Homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide, or nitrile thereof

Event Publications

28 August 2003 Complete Application Filed

  Priority application(s): 60/383,607 29.05.02 US

12 February 2004 Application Open to Public Inspection

  Published as AU-A-2003232437

17 February 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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