PROCESS FOR COATING SILICON SHOT WITH DOPANT FOR ADDITION OF DOPANT IN CRYSTAL GROWTH

Details for Australian Patent Application No. 2003231027 (hide)

Owner RWE SCHOTT SOLAR, INC.

Inventors PIWCZYK, Bernhard, P.

Pub. Number AU-A-2003231027

PCT Number PCT/US03/12395

PCT Pub. Number WO2003/095718

Priority 10/142,312 09.05.02 US

Filing date 21 April 2003

Wipo publication date 11 November 2003

International Classifications

C30B 029/06 Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape - Silicon

C30B 015/02 Single-crystal growth by pulling from a melt, e.g. Czochralski method - adding crystallising materials or reactants forming it to the melt

C30B 015/04 Single-crystal growth by pulling from a melt, e.g. Czochralski method

Event Publications

14 August 2003 Complete Application Filed

  Priority application(s): 10/142,312 09.05.02 US

15 January 2004 Application Open to Public Inspection

  Published as AU-A-2003231027

27 January 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

10 December 2009 Corrigenda

  Applications OPI - Name Index Under the name RWE Schott Solar, Inc., Application No. 2003231027, under INID (43) correct the publication date to read 24.11.2003

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