VAPOR DEPOSITION OF SILICON DIOXIDE NANOLAMINATES

Details for Australian Patent Application No. 2003228402 (hide)

Owner PRESIDENT AND FELLOWS OF HARVARD COLLEGE

Inventors GORDON, Roy, G.; HAUSMANN, Dennis; BECKER, Jill

Pub. Number AU-A-2003228402

PCT Number PCT/US03/09736

PCT Pub. Number WO2003/083167

Priority 60/415,617 02.10.02 US; 60/368,292 28.03.02 US

Filing date 28 March 2003

Wipo publication date 13 October 2003

International Classifications

C23C 016/40 Chemical deposition or plating by decomposition - Oxides

Event Publications

14 August 2003 Complete Application Filed

  Priority application(s): 60/415,617 02.10.02 US; 60/368,292 28.03.02 US

20 November 2003 Application Open to Public Inspection

  Published as AU-A-2003228402

6 January 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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