POSITIVELY PHOTOSENSITIVE RESIN COMPOSITION AND METHOD OF PATTERN FORMATION

Details for Australian Patent Application No. 2003227418 (hide)

Owner NISSAN CHEMICAL INDUSTRIES, LTD.

Inventors HATANAKA, Tadashi; NIHIRA, Takayasu

Pub. Number AU-A-2003227418

PCT Number PCT/JP03/04954

PCT Pub. Number WO2003/087941

Priority 2002-115566 18.04.02 JP

Filing date 18 April 2003

Wipo publication date 27 October 2003

International Classifications

G03F 007/039 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Macromolecular compounds which are photodegradable, e.g. positive electron resists

G03F 007/022 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Quinonediazides

G03F 007/40 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Treatment after imagewise removal, e.g. baking

Event Publications

14 August 2003 Complete Application Filed

  Priority application(s): 2002-115566 18.04.02 JP

4 December 2003 Application Open to Public Inspection

  Published as AU-A-2003227418

13 January 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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