EXPOSURE DEVICE, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD

Details for Australian Patent Application No. 2003227194 (hide)

Owner NIKON CORPORATION

Inventors TSUJI, Toshihiko; KIMURA, Takaaki; NAGAHASHI, Yoshitomo

Pub. Number AU-A-2003227194

PCT Number PCT/JP03/03539

PCT Pub. Number WO2003/081648

Priority 2002-82044 22.03.02 JP

Filing date 24 March 2003

Wipo publication date 8 October 2003

International Classifications

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

G03F 007/20 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Exposure

Event Publications

7 August 2003 Complete Application Filed

  Priority application(s): 2002-82044 22.03.02 JP

13 November 2003 Application Open to Public Inspection

  Published as AU-A-2003227194

23 December 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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