APPARATUS AND METHOD FOR DEPOSITING THIN FILM ON WAFER USING REMOTE PLASMA

Details for Australian Patent Application No. 2003223126 (hide)

Owner IPS LTD.

Inventors LEE, Sang-Kyu; KYUNG, Hyun-Soo; BAE, Jang-Ho; PARK, Young-Hoon; LIM, Hong-Joo

Pub. Number AU-A-2003223126

PCT Number PCT/KR03/00786

PCT Pub. Number WO2003/089683

Priority 10-2002-0021554 19.04.02 KR

Filing date 17 April 2003

Wipo publication date 3 November 2003

International Classifications

C23C 016/455 Chemical deposition or plating by decomposition - characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber

Event Publications

7 August 2003 Complete Application Filed

  Priority application(s): 10-2002-0021554 19.04.02 KR

11 December 2003 Application Open to Public Inspection

  Published as AU-A-2003223126

13 January 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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