PROCESS AND SYSTEM FOR HEATING SEMICONDUCTOR SUBSTRATES IN A PROCESSING CHAMBER CONTAINING A SUSCEPTOR

Details for Australian Patent Application No. 2003221961 (hide)

Owner MATTSON TECHNOLOGY, INC

Inventors LEE, Young, Jai; WANG, Ronald, L.; LY, Steven; DEVINE, Daniel, J.

Pub. Number AU-A-2003221961

PCT Number PCT/US03/11734

PCT Pub. Number WO2003/096396

Priority 10/141,515 07.05.02 US

Filing date 15 April 2003

Wipo publication date 11 November 2003

International Classifications

H01L 021/20 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

C30B 025/12 Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour deposition growth - Substrate holders or susceptors

C23C 016/44 Chemical deposition or plating by decomposition - characterised by the method of coating

Event Publications

7 August 2003 Complete Application Filed

  Priority application(s): 10/141,515 07.05.02 US

15 January 2004 Application Open to Public Inspection

  Published as AU-A-2003221961

27 January 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

12 November 2009 Corrigenda

  Applications OPI - Name Index Under the name Mattson Technology, Inc, Application No. 2003221961, under INID (43) correct the publication date to read 24.11.2003

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