SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD, FAST ROTARY VALVES, CLEANING METHOD

Details for Australian Patent Application No. 2003221137 (hide)

Owner TOKYO ELECTRON LIMITED

Inventors SHINRIKI, Hiroshi; ARAMI, Junichi

Pub. Number AU-A-2003221137

PCT Number PCT/JP03/03655

PCT Pub. Number WO2003/081659

Priority 2002-86774 26.03.02 JP

Filing date 25 March 2003

Wipo publication date 8 October 2003

International Classifications

H01L 021/31 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

F16K 005/04 Taps or cocks comprising only cut-off apparatus having at least one of the sealing faces shaped as a more or less complete surface of a solid of revolution, the opening and closing movement being predominantly rotary

F16K 051/02 Other details not peculiar to particular types of valves or cut-off apparatus - specially adapted for high-vacuum installations

Event Publications

7 August 2003 Complete Application Filed

  Priority application(s): 2002-86774 26.03.02 JP

13 November 2003 Application Open to Public Inspection

  Published as AU-A-2003221137

16 December 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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