APPARATUS AND METHODS FOR DETECTING TRANSITIONS OF WAFER SURFACE PROPERTIES IN CHEMICAL MECHANICAL POLISHING FOR PROCESS STATUS AND CONTROL

Details for Australian Patent Application No. 2003220552 (hide)

Owner LAM RESEARCH CORPORATION

Inventors OWCZARZ, Aleksander; MOREL, Bruno; KISTLER, Rodney; HEMKER, David, J.; GOTKIS, Yehiel

Pub. Number AU-A-2003220552

PCT Number PCT/US03/09421

PCT Pub. Number WO2003/082522

Priority 10/113,151 28.03.02 US

Filing date 26 March 2003

Wipo publication date 13 October 2003

International Classifications

B24B 049/10 Measuring - involving electrical means

B24B 049/14 Measuring

H01L 021/66 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof - Testing or measuring during manufacture or treatment

B24B 049/12 Measuring - involving optical means

Event Publications

31 July 2003 Complete Application Filed

  Priority application(s): 10/113,151 28.03.02 US

20 November 2003 Application Open to Public Inspection

  Published as AU-A-2003220552

16 December 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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