SILICON PARTS FOR PLASMA REACTION CHAMBERS

Details for Australian Patent Application No. 2003220446 (hide)

Owner LAM RESEARCH CORPORATION

Inventors REN, Daxing; HUBACEK, Jerome, S.; WEBB, Nicholas, E.

Pub. Number AU-A-2003220446

PCT Number PCT/US03/08702

PCT Pub. Number WO2003/090263

Priority 60/373,489 17.04.02 US; 10/247,722 20.09.02 US

Filing date 21 March 2003

Wipo publication date 3 November 2003

International Classifications

H01L 021/00 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/316 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/306 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01J 001/00 Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps

C23C 016/44 Chemical deposition or plating by decomposition - characterised by the method of coating

H01J 037/32 Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof - Gas-filled discharge tubes

H01L 021/30 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

31 July 2003 Complete Application Filed

  Priority application(s): 60/373,489 17.04.02 US; 10/247,722 20.09.02 US

11 December 2003 Application Open to Public Inspection

  Published as AU-A-2003220446

13 January 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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