ION IMPLANTATION OF SILICON OXID LINER TO PREVENT DOPANT OUT-DIFFUSION FROM SO URCE/ DRAIN EXTENSIONS

Details for Australian Patent Application No. 2003220198 (hide)

Owner ADVANCED MICRO DEVICES, INC.

Inventors WEI, Andy, C.; FUSELIER, Mark, B.; YEH, Ping-Chin

Pub. Number AU-A-2003220198

PCT Number PCT/US03/07559

PCT Pub. Number WO2003/083929

Priority 10/105,522 26.03.02 US

Filing date 13 March 2003

Wipo publication date 13 October 2003

International Classifications

H01L 021/336 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/265 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

31 July 2003 Complete Application Filed

  Priority application(s): 10/105,522 26.03.02 US

20 November 2003 Application Open to Public Inspection

  Published as AU-A-2003220198

16 December 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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