METHOD, SYSTEM AND MEDIUM FOR CONTROLLING SEMICONDUCTOR WAFER PROCESSES USING CRITICAL DIMENSION MEASUREMENTS

Details for Australian Patent Application No. 2003218285 (hide)

International Classifications

Event Publications

31 July 2003 Complete Application Filed

Priority application(s): 10/100,184 19.03.02 US

13 November 2003 Application Open to Public Inspection

Published as AU-A-2003218285

9 December 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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