METHOD FOR COATING A SUBSTRATE AND DEVICE FOR CARRYING OUT THE METHOD

Details for Australian Patent Application No. 2003215669 (hide)

Owner AIXTRON AG

Inventors JURGENSEN, Holger; HEUKEN, Michael

Pub. Number AU-A-2003215669

PCT Number PCT/EP03/02860

PCT Pub. Number WO2003/080893

Priority 102 12 923.1 22.03.02 DE

Filing date 19 March 2003

Wipo publication date 8 October 2003

International Classifications

C23C 016/448 Chemical deposition or plating by decomposition - characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials

C23C 014/22 Coating by vacuum evaporation, by sputtering or by ion implantation - characterised by the process of coating

C23C 014/54 Coating by vacuum evaporation, by sputtering or by ion implantation - Controlling or regulating the coating process

C23C 016/52 Chemical deposition or plating by decomposition - Controlling or regulating the coating process

C23C 014/12 Coating by vacuum evaporation, by sputtering or by ion implantation - Organic material

Event Publications

31 July 2003 Complete Application Filed

  Priority application(s): 102 12 923.1 22.03.02 DE

13 November 2003 Application Open to Public Inspection

  Published as AU-A-2003215669

9 December 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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