FLUORINATED COPOLYMERS FOR MICROLITHOGRAPHY

Details for Australian Patent Application No. 2003213568 (hide)

Owner E.I. DU PONT DE NEMOURS AND COMPANY

Inventors FEIRING, Andrew, Edward; SCHADT, Frank, L., III; TAYLOR, Gary, Newton

Pub. Number AU-A-2003213568

PCT Number PCT/US03/05705

PCT Pub. Number WO2003/075094

Priority 60/361,124 01.03.02 US; 60/389,790 19.06.02 US

Filing date 26 February 2003

Wipo publication date 16 September 2003

International Classifications

G03F 007/004 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Photosensitive materials

G03F 007/039 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Macromolecular compounds which are photodegradable, e.g. positive electron resists

C08F 214/18 Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen

Event Publications

31 July 2003 Complete Application Filed

  Priority application(s): 60/361,124 01.03.02 US; 60/389,790 19.06.02 US

23 October 2003 Application Open to Public Inspection

  Published as AU-A-2003213568

18 November 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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