GAS DRIVEN PLANETARY ROTATION APPARATUS AND METHODS FOR FORMING SILICON CARBIDE LAYERS

Details for Australian Patent Application No. 2003212902 (hide)

Owner CREE, INC.

Inventors PAISLEY, Michael, James; SUMAKERIS, Joseph, John

Pub. Number AU-A-2003212902

PCT Number PCT/US03/03196

PCT Pub. Number WO2003/088325

Priority 10/117,858 08.04.02 US

Filing date 4 February 2003

Wipo publication date 27 October 2003

International Classifications

H01L 021/00 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

C23C 014/50 Coating by vacuum evaporation, by sputtering or by ion implantation - Substrate holders

C23C 016/458 Chemical deposition or plating by decomposition - characterised by the method used for supporting substrates in the reaction chamber

C30B 025/12 Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour deposition growth - Substrate holders or susceptors

Event Publications

24 July 2003 Complete Application Filed

  Priority application(s): 10/117,858 08.04.02 US

4 December 2003 Application Open to Public Inspection

  Published as AU-A-2003212902

23 December 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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