PHOTOSENSITIVE RESIN COMPOSITIONS

Details for Australian Patent Application No. 2003211755 (hide)

Owner HITACHI CHEMICAL CO., LTD.

Inventors KATAGI, Hideyuki; YOSHINO, Toshizumi; KURISAKI, Yasuyuki; KONDOU, Hidekazu; JOUMEN, Masayoshi; SATOU, Kuniaki; HIRAYAMA, Takao

Pub. Number AU-A-2003211755

PCT Number PCT/JP03/02663

PCT Pub. Number WO2003/075095

Priority 2002-60361 06.03.02 JP; 2002-116542 18.04.02 JP

Filing date 6 March 2003

Wipo publication date 16 September 2003

International Classifications

G03F 007/027 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

G03F 007/032 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - with binders

Event Publications

24 July 2003 Complete Application Filed

  Priority application(s): 2002-60361 06.03.02 JP; 2002-116542 18.04.02 JP

23 October 2003 Application Open to Public Inspection

  Published as AU-A-2003211755

25 November 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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