PHOTOSENSITIVE RESINS, RESIN COMPOSITIONS AND PRODUCTS OF CURING THEREOF

Details for Australian Patent Application No. 2003211706 (hide)

Owner NIPPON KAYAKU KABUSHIKI KAISHA

Inventors KOYANAGI, Hiroo; NAKAYAMA, Koji; UMEYAMA, Chie; KAWADA, Yoshihiro; YOKOSHIMA, Minoru

Pub. Number AU-A-2003211706

PCT Number PCT/JP03/02081

PCT Pub. Number WO2003/072634

Priority 2002-299047 11.10.02 JP; 2002-302101 16.10.02 JP; 2002-48865 26.02.02 JP

Filing date 25 February 2003

Wipo publication date 9 September 2003

International Classifications

C08G 063/91 Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule

G02B 006/12 Light guides - of the integrated circuit kind

G02B 006/122 Light guides - Basic optical elements, e.g. light-guiding paths

C08F 290/06 Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups

C08L 067/06 Compositions of polyesters obtained by reactions forming a carboxylic ester link in the main chain

Event Publications

24 July 2003 Complete Application Filed

  Priority application(s): 2002-299047 11.10.02 JP; 2002-302101 16.10.02 JP; 2002-48865 26.02.02 JP

16 October 2003 Application Open to Public Inspection

  Published as AU-A-2003211706

23 October 2003 Application Open to Public Inspection

  Published as AU-A-2003211706

11 November 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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