PROJECTION OPTICAL SYSTEM ADJUSTMENT METHOD, PREDICTION METHOD, EVALUATION METHOD, ADJUSTMENT METHOD, EXPOSURE METHOD, EXPOSURE DEVICE, PROGRAM, AND DEVICE MANUFACTURING METHOD

Details for Australian Patent Application No. 2003211559 (hide)

Owner NIKON CORPORATION

Inventors HIRUKAWA, Shigeru; NAKASHIMA, Toshiharu; HIGASHI, Kenji

Pub. Number AU-A-2003211559

PCT Number PCT/JP03/02375

PCT Pub. Number WO2003/075328

Priority 2002-56116 01.03.02 JP; 2003-43682 21.02.03 JP

Filing date 28 February 2003

Wipo publication date 16 September 2003

International Classifications

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

G03F 007/20 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Exposure

Event Publications

24 July 2003 Complete Application Filed

  Priority application(s): 2002-56116 01.03.02 JP; 2003-43682 21.02.03 JP

23 October 2003 Application Open to Public Inspection

  Published as AU-A-2003211559

18 November 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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