EXPOSURE EQUIPMENT AND DEVICE MANUFACTURING METHOD

Details for Australian Patent Application No. 2003211556 (hide)

Owner NIKON CORPORATION

Inventors SHIRAISHI, Naomasa

Pub. Number AU-A-2003211556

PCT Number PCT/JP03/02374

PCT Pub. Number WO2003/075327

Priority 2002-55380 01.03.02 JP; 2002/220103 29.07.02 JP

Filing date 28 February 2003

Wipo publication date 16 September 2003

International Classifications

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

G03F 007/20 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Exposure

Event Publications

24 July 2003 Complete Application Filed

  Priority application(s): 2002-55380 01.03.02 JP; 2002/220103 29.07.02 JP

23 October 2003 Application Open to Public Inspection

  Published as AU-A-2003211556

18 November 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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