DEVICE AND METHOD FOR HEAT TREATMENT

Details for Australian Patent Application No. 2003211416 (hide)

Owner FUTEK FURNACE INC.

Inventors KANDA, Minoru; KANADA, Wataru; UENO, Hiroto; MIWA, Kazuo; KOMURO, Kenji

Pub. Number AU-A-2003211416

PCT Number PCT/JP03/01950

PCT Pub. Number WO2003/071589

Priority 2002-48629 25.02.02 JP; 2002-48634 25.02.02 JP

Filing date 21 February 2003

Wipo publication date 9 September 2003

International Classifications

H01L 021/02 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof -

H01L 043/12 Devices using galvano-magnetic or similar magnetic effects

H01L 027/10 Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate - including a plurality of individual components in a repetitive configuration

H01F 010/00 Thin magnetic films, e.g. of one-domain structure

H01F 041/00 Apparatus or processes specially adapted for manufacturing or assembling the devices covered by this subclass

F27B 005/00 Muffle furnaces

Event Publications

24 July 2003 Complete Application Filed

  Priority application(s): 2002-48629 25.02.02 JP; 2002-48634 25.02.02 JP

9 October 2003 Application Open to Public Inspection

  Published as AU-A-2003211416

11 November 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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