PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD

Details for Australian Patent Application No. 2003211351 (hide)

Owner MATSUSHITA ELECTRIC WORKS, LTD. HAIDEN LABORATORY INC.

Inventors TAGUCHI, Noriyuki; SAWADA, Yasushi; MATSUNAGA, Kohichi

Pub. Number AU-A-2003211351

PCT Number PCT/JP03/01847

PCT Pub. Number WO2003/071839

Priority 2002-305002 18.10.02 JP; 2002-43868 20.02.02 JP

Filing date 20 February 2003

Wipo publication date 9 September 2003

International Classifications

H05H 001/24 Generating plasma - Generating plasma

H01L 021/3065 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

C23C 016/509 Chemical deposition or plating by decomposition

H01L 021/205 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

24 July 2003 Complete Application Filed

  Priority application(s): 2002-305002 18.10.02 JP; 2002-43868 20.02.02 JP

9 October 2003 Application Open to Public Inspection

  Published as AU-A-2003211351

4 November 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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