METHOD FOR SELECTIVELY COATING A PORTION OF A SUBSTRATE WITH A GAS-CARRIED SUBSTANCE

Details for Australian Patent Application No. 2003207736 (hide)

Owner SULZER METCO (US) INC.

Inventors MARIJNISSEN, Giel; VERGELDT, E. R. I. C.; WALSWEER, W.; JACOBS, B.T.F.

Pub. Number AU-A-2003207736

PCT Number PCT/US03/02662

PCT Pub. Number WO2003/064718

Priority 60/352,891 29.01.02 US

Filing date 28 January 2003

Wipo publication date 2 September 2003

International Classifications

C23C 014/04 Coating by vacuum evaporation, by sputtering or by ion implantation - Coating on selected surface areas, e.g. using masks

C23C 016/455 Chemical deposition or plating by decomposition - characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber

C23C 014/16 Coating by vacuum evaporation, by sputtering or by ion implantation - on metallic substrates or on substrates of boron or silicon

C23C 016/04 Chemical deposition or plating by decomposition - Coating on selected surface areas, e.g. using masks

C23C 016/12 Chemical deposition or plating by decomposition

C23C 016/20 Chemical deposition or plating by decomposition

Event Publications

17 July 2003 Complete Application Filed

  Priority application(s): 60/352,891 29.01.02 US

18 September 2003 Application Open to Public Inspection

  Published as AU-A-2003207736

14 October 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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