PROCESS AND APPRATUS FOR REMOVAL OF PHOTORESIST FROM SEMICONDUCTOR WAFERS USING SPRAY NOZZLES

Details for Australian Patent Application No. 2003205245 (hide)

Event Publications

17 July 2003 Complete Application Filed

Priority application(s): 10/053,371 18.01.02 US

18 September 2003 Application Open to Public Inspection

Published as AU-A-2003205245

7 October 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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