STAGE DEVICE AND EXPOSURE DEVICE

Details for Australian Patent Application No. 2003203229 (hide)

Owner NIKON CORPORATION

Inventors ARAI, Dai

Pub. Number AU-A-2003203229

PCT Number PCT/JP03/00267

PCT Pub. Number WO2003/063212

Priority 2002-11806 21.01.02 JP

Filing date 15 January 2003

Wipo publication date 2 September 2003

International Classifications

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/68 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

G03F 007/22 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Exposing sequentially with the same light pattern different positions of the same surface

Event Publications

10 April 2003 Complete Application Filed

  Priority application(s): 2002-11806 21.01.02 JP

18 September 2003 Application Open to Public Inspection

  Published as AU-A-2003203229

7 October 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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