METHOD OF PRODUCING AN ETCHRESISTANT POLYMER STRUCTURE USING ELECTRON BEAM LITHOGRAPHY

Details for Australian Patent Application No. 2003202379 (hide)

Owner QUANTISCRIPT INC.

Inventors BEAUVAIS, Jacques; DROUIN, Dominique; CLOUTIER, Melanie; LAVALLEE, Eric

Pub. Number AU-A-2003202379

PCT Number PCT/CA03/00136

PCT Pub. Number WO2003/079112

Priority 2,377,081 15.03.02 CA

Filing date 31 January 2003

Wipo publication date 29 September 2003

International Classifications

G03F 007/004 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Photosensitive materials

G03F 001/14 Preparation of originals for the photomechanical production of textured or patterned surfaces - Originals characterised by structural details, e.g. supports, cover layers, pellicle rings

G03F 007/20 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Exposure

Event Publications

3 April 2003 Complete Application Filed

  Priority application(s): 2,377,081 15.03.02 CA

6 November 2003 Application Open to Public Inspection

  Published as AU-A-2003202379

2 December 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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