HIGHLY PURE ULTRA-FINE SiOX POWDER AND METHOD FOR PRODUCTION THEREOF

Details for Australian Patent Application No. 2003201860 (hide)

Owner DENKI KAGAKU KOGYO KABUSHIKI KAISHA

Inventors IMAMURA, Yasuo; NONOGAKI, Ryozo

Pub. Number AU-A-2003201860

PCT Number PCT/JP03/00158

PCT Pub. Number WO2003/059816

Priority 2002-3226 10.01.02 JP

Filing date 10 January 2003

Wipo publication date 30 July 2003

International Classifications

C01B 033/113 Silicon

H01L 021/316 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

C23C 014/24 Coating by vacuum evaporation, by sputtering or by ion implantation - Vacuum evaporation

A23L 003/00 Preservation of foods or foodstuffs, in general, e.g. pasteurising, sterilising, specially adapted for foods or foodstuffs

H01L 031/04 Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength, or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation - adapted as conversion devices

G02B 001/10 Optical elements characterised by the material of which they are made - Optical coatings produced by application to, or surface treatment of, optical elements

Event Publications

3 April 2003 Complete Application Filed

  Priority application(s): 2002-3226 10.01.02 JP

4 September 2003 Application Open to Public Inspection

  Published as AU-A-2003201860

30 September 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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